Phase Transformation and Characterization of 3D Reactive Microstructures in Nanoscale Al/Ni Multilayers

Reactive multilayer systems represent an innovative approach for potential usage in chip joining applications. As there are several factors governing the energy release rate and stored chemical energy, impact of morphology microstructure on reaction behavior is great interest. In current work, 3D reactive microstructures with nanoscale Al/Ni multilayers were produced by alternating deposition pure Ni Al films onto nanostructured Si substrates magnetron sputtering. order to elucidate influence this phase transformation process, system characterized compared a flat wafer. The characterization both was carried out before after rapid thermal annealing treatment using scanning transmission electron microscopy cross sections, selected area diffraction analysis, differential calorimetry. bent shape caused complex topography silicon needles substrate found favor atomic diffusion at early stage formation two intermetallic phases Al0.42Ni0.58 AlNi3, unlike that formed single AlNi reaction.